WAFER WASHING APPARATUS,申请号JP19850267502-传众专利搜索

WAFER WASHING APPARATUS

申请公布号：JPS62128125(A)

申请号：JP19850267502

申请日期：1985.11.29

申请公布日期：1987.06.10

申请人：

CANON INC;CANON HANBAI KK

发明人：KAWAURA HIROSHI

分类号：B08B3/04;H01L21/304

主分类号：B08B3/04

摘要：PURPOSE:To facilitate the maintenance of washing implements, to enable various washing liquids other than pure water to be utilized and to decreasing the space for installation, by providing upper and lower washing tanks on both sides of a wafer conveying line and arranging means for conveying a wafer to the lower washing tanks within the upper washing tank together with the washing implements. CONSTITUTION:A wafer 6 conveyed along a conveying line 5 is sucked by a chuck 2 which is being elevated. The wafer thus sucked is moved into a first washing tank 10 and stopped at a predetermined position. A coupling tube 21 is then elevated so that upper and lower washing tanks 10 and 11 are coupled with each other through the coupling tube 21 to constitute a single tank. Washing operations with brushes and with jets are performed in predetermined orders. A washing liquid other than solvents such as pure water is used during these operations and dropped down from a nozzle 14. The wafer 6 which has been washed in the upper washing tank 10 is transferred to the lower washing tank 11 by the descending chuck 2. In the lower washing tank 11, the wafer is washed with an organic solvent or the like dropped down from a nozzle 15. The wafer 6 is then rotated to be dried centrifugally. Thus, all the washing processes are completed. The wafer 6 is then elevated as it is held by the chuck 2 while, simultaneously, the coupling tube 21 is lowered to its original position, and the wafer 6 is conveyed to the wafer conveying line 5.