RESIST APPLYING APPARATUS
申请公布号:JPS61219135(A)
申请号:JP19850059846
申请日期:1985.03.25
申请公布日期:1986.09.29
发明人:MIKANOHARA MASAKO
分类号:B05C11/08;H01L21/027;H01L21/30
主分类号:B05C11/08
摘要:PURPOSE:To prevent any unrequired resist splittings from being produced after the resist applying process, by providing means for removing the resist adhered on the peripheral face of a plate. CONSTITUTION:The present resist applying apparatus is provided with an arm 7 moving along the peripheral face of a plate 3 and with a wiper 8 fixed at the tip end of the arm. The plate 3 generally has a square shape and the arm 7 is adapted to move along the peripheral face of the square plate 3. This means that the movement of the arm 7 is confined to linear reciprocating movements along a groove 9. Since the groove 9 is provided in parallel with one side of the square plate 3, one advancing movement of the arm 7 removes the resist from one side of the square. When the resist removal from the one side is finished, the square plate 3 is rotated by 90 deg. by means of a rotating device and the arm 7 moves backward. Thus, all the resist on the four sides of the square plate 3 can be completely removed by two reciprocating movements of the arm 7.
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