PHOTOSENSITIVE SILVER HALIDE MATERIAL,申请号JP19840205000-传众专利搜索

PHOTOSENSITIVE SILVER HALIDE MATERIAL

申请公布号：JPS6180239(A)

申请号：JP19840205000

申请日期：1984.09.28

申请公布日期：1986.04.23

申请人：

MITSUBISHI PAPER MILLS LTD

发明人：YAMADA SHOJI;MATSUBARA EIJI

分类号：C07D413/12;C07D403/12;C07D417/12;G03C1/34;G03C7/305

主分类号：C07D413/12

摘要：PURPOSE:To maintain the high sensitivity and to prevent fog by incorporating a compound having a specified anti-fogging mercapto group which is table in neutral and acidic regions and is activated in an alkaline region during development into a silver halide emulsion layer. CONSTITUTION:A compound represented by the formula is used as an anti- foggant. In the formula, A is an anti-fogging mercapto-heterocyclic group, R is H, R<1> is H, alkyl or substituted alkyl, and R2 is H, halogen, hydroxy, alkyl or alkoxy. The heterocyclic group may be tetrazole, benzoxazole, benzothiazole or benzoimidazole. The anti-foggant is incorporated into a silver halide emulsion layer or a colloidal layer on the emulsion layer. Thus, a photosensitive material contains the anti-foggant, so the high sensitivity is maintained during develop ment, and fog can be prevented.