MANUFACTURING APPARATUS FOR SEMICONDUCTOR,申请号JP19840251066-传众专利搜索

MANUFACTURING APPARATUS FOR SEMICONDUCTOR

申请公布号：JPS61129811(A)

申请号：JP19840251066

申请日期：1984.11.28

申请公布日期：1986.06.17

申请人：

MITSUBISHI ELECTRIC CORP

发明人：KOBAYASHI TOSHIYUKI;OTOMO YOSHIMI;KINOSHITA NORIYOSHI;ODA MASAO

分类号：H01L21/20;H01L21/205;H01L21/263;H01L21/31

主分类号：H01L21/20

摘要：PURPOSE:To make it possible to form a film with uniform thickness by providing a light source transfer mechanism to transfer the light source. CONSTITUTION:When a reaction gas 4 is introduced into the reaction chamber 1, the gas is excited and decomposed by being lighted with the light from the light source 12, and the reaction products by this reaction deposit on the base board 5 to form a thin film on the base board 5. At this time, the light source 12 is transferred to the direction of the axis of the lamp through a light source transfer mechanism 18 so that the amount of the light energy fed on the base board 5 from the light source 12 will be uniform in this direction, being the integral value of the light energy distribution from the light source in this transfer direction. As a result, the amount of the light energy provided on the base board 5 is uniform in the transferring direction of the light source 12, thereby providing a uniform thickness of the thin film in this direction.