CORRECTING METHOD OF LIGHT QUANTITY CONTROL DEVICE,申请号JP19840042820-传众专利搜索

CORRECTING METHOD OF LIGHT QUANTITY CONTROL DEVICE

申请公布号：JPS60188950(A)

申请号：JP19840042820

申请日期：1984.03.08

申请公布日期：1985.09.26

申请人：

CANON KK

发明人：MATSUKI TOSHIO;SATOU HIROSHI

分类号：G03B27/72;G03F7/20;H01L21/027

主分类号：G03B27/72

摘要：PURPOSE:To detect an output of light printed actually by measuring a wafer surface, and to correct an output of an exposing device, by providing a reference illuminance measuring instrument on a wafer stage for executing an alignment of a wafer and a photomask. CONSTITUTION:As for luminous flux radiated from a mercury-arc lamp 1, when a shutter 4 is opened by an exposure command source which is not shown in the figure, a part of the luminous flux is curved by a reflecting mirror 5 and made incident on a photodetecting part 6a of an integrating exposing device 6. On the other hand, the luminous flux for printing passes through a condenser lens 7 and a reflecting mirror 8 and illuminates uniformly a mask surface (a) by a condenser lens 9, passes through a reducing projection lens 10 and it is made incident on a reference illuminance measuring instrument 11 installed on a wafer stage 12. In this case, the gain adjustment is executed to match an output of a pre-amplifier of the illuminance measuring instrument 11 installed on the output wafer stage 12 of a pre-amplifier of a photodetector 6a of the exposing device 6. In this way, an output of a light which is printed actually is detected and based on it as a reference, an output of the exposing device is corrected, therefore, a stable exposure can always be obtained.