LITHOGRAPHIC PLATE MATERIAL

申请公布号：JPS60123846(A)

申请号：JP19830231242

申请日期：1983.12.09

申请公布日期：1985.07.02

申请人：

KONISHIROKU SHASHIN KOGYO KK

发明人：SHIMURA KAZUHIRO;GOTOU SEI

分类号：B41N1/08;B41N3/03;G03F7/004

主分类号：B41N1/08

摘要：PURPOSE:To facilitate erasion of traces of layout by subjecting a positive type lithographic plate support to anodic oxidation and treating it with fluorozirconate. CONSTITUTION:An aluminum plate is electrolytically roughened on the surface in a bath composed essentially of nitric acid, and on this face and anodic oxidation film is formed. On this layer a film obtained by treating the film with fluorozirconate is formed, and it is coated with a photosensitive layer compsn. contg. a polyhydroxy polymer o-naphthoquinonediazidesulfonate and a phenol- cresol mixture novolak resin. The photosensitive layer thus obtained cannot be freed of layout traces by the known alkaline development, and the traces cannot be erased perfectly with an erasing soln. containing no hydrofluoric acid. The formation of said film obtained by treating the film with the 0.001-0.2wt% fluorozirconate soln. permits perfect erasion.

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