GLASS MASK,申请号JP19830162519-传众专利搜索

GLASS MASK

申请公布号：JPS6055344(A)

申请号：JP19830162519

申请日期：1983.09.06

申请公布日期：1985.03.30

申请人：

OKI DENKI KOGYO KK;MIYAZAKI OKI DENKI KK

发明人：YOSHITOME SHIYOUKICHI

分类号：G03F1/00;G03F1/48;H01L21/027

主分类号：G03F1/00

摘要：PURPOSE:To prevent the occurrence of pattern defects and to improve the yield of products by forming a mask pattern between a pair of glass substrates superposed on each other. CONSTITUTION:A mask pattern 12 made of a metallic film or a metallic oxide film is formed on one side of the 1st glass substrate 11, and the 2nd glass substrate 13 is superposed on the pattern 12. The peripheral parts of the substrates 13, 11 are adhered to each other with an adhesive 14 to keep the space between the substrates 11, 13 from dust, a chemical soln., etc. Since the substrates 11, 13 act as protectors, the occurrence of defects in the mask pattern 12 due to scratching is prevented when the resulting glass mask is handled. Dust sticks to not the pattern 12 but the outside of the substrate 13, so dust 15 is not transferred to a resist 18 on a silicon wafer 17 when the pattern 12 is transferred to the resist 18 with parallel rays 16 of light. Accordingly, the normal mask pattern can be transferred, and the yield of integrated circuits can be remarkably improved. Washing for removing dust can be made unnecessary.