VALVE

申请公布号：JPS605870(A)

申请号：JP19830112845

申请日期：1983.06.24

申请公布日期：1985.01.12

申请人：

TOSHIBA KK

发明人：TADA KAORU;KAWAI MITSUO;FUJIWARA TETSUO

分类号：F16K1/42;C23C10/28;C23C12/02;(IPC1-7):C23C8/30

主分类号：F16K1/42

摘要：PURPOSE:To obtain a valve having superior cavitation erosion resistance by diffusing an Ni layer formed on at least the surface of the valve seat of a Ti or Ti alloy valve. CONSTITUTION:An Ni layer of about 60mum thickness formed by vapor deposition, electroless plating or other method on at least the surface of the valve seat of a valve made of Ti or a Ti alloy contg. >= about 50wt%, preferably >=80% Ti is diffused by heating to obtain a valve having superior cavitation erosion resistance and suitable for use in an analyzing line or the like in a chemical plant or a power plant. By vapor-depositing Si, Cr, B or the like together with Ni, the m.p. of the resulting layer can be dropped to facilitate diffusion.

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