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COMPOSICION TENIBLE PARA REVESTIMIENTO DE ARTICULOS DE RESINA SINTETICA,RESISTENTE AL RAYADO

申请公布号:MX151180(A)

申请号:MX19790180505

申请日期:1979.12.13

申请公布日期:1984.10.09

申请人:
MITSUBISHI RAYON CO.,LTD.

发明人:KAZUMASA KAMADA;ISAO SASAKI;KENJI KUSHI

分类号:C08F2/00;C08F2/48;C08F20/00;C08F20/10;C08F20/20;C08F20/28;C08F30/00;C08F30/02;C08F220/00;C08F220/26;C08F290/00;C08F299/00;C09D4/00;C09D5/00;C09D171/00;(IPC1-7):C09D3/80

主分类号:C08F2/00

摘要:<p>Coating compositions comprising a polyfunctional monomer of a mono or polypentaerythritol poly(meth)acrylate, a bifunctional (meth)acrylate having specific monomer structure, an additional (meth)acrylate containing not more than 2 (meth)acryloyloxy groups, a phosphoric acid ester and an ethanolamine all blended together in a suitable organic solvent system together with a photosensitizer are disclosed. The compositions provide a scratch-resistant, hard cross-linked film surface that is dyeable and resists static and fogging to a synthetic resin article, such as polymethyl methacrylate, to which they are applied.</p>

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