SUBSTRATE FOR ELECTRODE,申请号JP19810095197-传众专利搜索

SUBSTRATE FOR ELECTRODE

申请公布号：JPS57210676(A)

申请号：JP19810095197

申请日期：1981.06.22

申请公布日期：1982.12.24

申请人：

HOYA DENSHI:KK

发明人：HATSUTORI NORIYUKI;KAWAI HISAO

分类号：H01L31/04;H01L31/0224

主分类号：H01L31/04

摘要：PURPOSE:To obtain a substrate for a high transmission electrode in a simple structure by leaching both side surfaces of a glass plate to form low reflecting layers, and forming transparent electrode film on the low reflecting layer of one side, thereby reducing reflecting loss of incident light. CONSTITUTION:Both side surfaces of a glass 15 capable of leaching are leached, thereby forming low reflecting layers 16, 16' of 2-3mum of thickness. Then, an ITO (indium-tin oxide) film of transparent electrode material is accumulated by an ordinary vacuum deposition method in a thickness of approx. 300Angstrom . A sintered oxidized indium containing 5wt% of oxidized tin is used as a material to be deposited. Since the light reflection in the boundary between the transparent substrate and the air or between the light transmission substrate and the transparent conductive film can be reduced in this manner, the substrate for the electrode of high transmission coefficient can be obtained. This can be utilized for a solar battery, an electroluminescent display unit or the like.