POSITIEVE RESIST EN WERKWIJZE VOOR HET VORMEN VAN EEN PATROON VOOR EEN POSITIEVE RESIST.
申请公布号:NL8200211(A)
申请号:NL19820000211
申请日期:1982.01.21
申请公布日期:1982.08.16
分类号:C09D133/10;(IPC1-7):C08F220/18;G03C1/68
主分类号:C09D133/10
METHOD FOR PRODUCING A NANOPOROUS POLYURETHANE-BASED COATING
IMPLEMENTATION METHOD AND SYSTEM OF VIRTUAL PRIVATE NETWORK
SEMICONDUCTOR WAFER, AND METHOD FOR PRODUCING SAME
Handhalterung für tragbare Multimedia-Geräte, Handys und Smartphones
System for controlling a conference process based on the online network
ENHANCED ANTIVIRAL THERAPY METHODS AND DEVICES
PROTECTION CONTROL MODULE UNIT LAMINATED RESIN MULTI CELL BATTERY PACK
Side light arrangement for a vehicle or trailer with an adjustable angular down light
Superhard constructions & method of making same
Telescopic illuminator with a lens arrangement