Photoresist stripper with dodecylsulfonic acid and chlorinated solvents
申请公布号:US4187191(A)
申请号:US19780928094
申请日期:1978.07.26
申请公布日期:1980.02.05
发明人:SIMPSON, GEORGE W JR
分类号:G03F7/42;(IPC1-7):C23G5/02;B08B3/08
主分类号:G03F7/42
摘要:A stripper for removing a photoresist mask. The stripper consists essentially, by volume, of about 50-85% tetrachloroethylene and ortho-dichlorobenzene in generally equal amounts, about 15-50% dodecylsulfonic acid, and up to 3% formic acid.