WERKWIJZE VOOR HET DOOREENMENGEN VAN EEN REACTIEMENG- SEL.

申请公布号：NL7807336(A)

申请号：NL19780007336

申请日期：1978.07.06

申请公布日期：1979.01.18

申请人：

PFAUDLER-WERKE A.G. TE SCHWETZINGEN, BONDSREPUBLIEK DUITSLAND.

分类号：B01F7/22;B01F7/16;B01J14/00;B01J19/18;(IPC1-7):B01F3/08

主分类号：B01F7/22

FLUX CORED ARC WELDING METHOD OF 9% NI STEEL

MOTOR

HEAD DRUM ASSEMBLY BODY

MOTOR FOR AMPLIFYING ENERGY

GALLIUM NITRIDE COMPOUND SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF

SYSTEM AND METHOD FOR CONTROLLING MUD GUN

APPARATUS FOR AUTOMATICALLY CONTROLLING REAL TIME BATCH CALL OF CHARGING MATERIAL IN BLAST FURNACE

METHOD FOR PLANARIZING POLYMER INSULATION FILM OF SEMICONDUCTOR DEVICE

SYNCHRONOUS MEMORY DEVICE PERFORMING LATCH AND COMMAND DECODING AT ONCE

METHOD FOR MANUFACTURING CHARGE STORAGE ELECTRODE OF HIGH DIELECTRIC CAPACITOR

LIGHTING SWITCH FOR EMERGENCY LAMP OPERATING AUTOMATICALLY IN EMERGENCY

CARRIER WITH COMPLEX LINK

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING CONTACT PLUG OF SEMICONDUCTOR DEVICE

BELT CONVEYOR PULLEY HAVING EXHAUST PORT

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE FOR PREVENTING CONNECTION BETWEEN PLUGS BY ETCHING PROCESS USING FLUORINE-BASED GAS

METHOD FOR MANUFACTURING GATE ELECTRODE OF SEMICONDUCTOR DEVICE

GLASS BULB FOR CATHODE RAY TUBE

VIDEO DISPLAY

METHOD FOR MANUFACTURING FINE T-TYPED(GAMMA-TYPED) GATE USING PHOTOLITHOGRAPHY PROCESS AND SACRIFICIAL INSULATION LAYER