X-RAY PHASE DIFFERENCE PHOTOGRAPHING DEVICE,申请号JP19990202094-传众专利搜索

X-RAY PHASE DIFFERENCE PHOTOGRAPHING DEVICE

申请公布号：JP2000356603(A)

申请号：JP19990202094

申请日期：1999.06.14

申请公布日期：2000.12.26

申请人：

NEC CORP

发明人：KOBAYASHI KENJI;IZUMI KOICHI;KIMURA SHIGERU;KIMURA HIDEKAZU

分类号：G01N23/04;(IPC1-7):G01N23/04

主分类号：G01N23/04

摘要：PROBLEM TO BE SOLVED: To provide an X-ray phase difference photographing device which is applicable for estimation of electronic devices and which has a high spatial resolution. SOLUTION: The X-ray phase difference photographing device comprises an X-ray source 11, a first spectro crystal pair 6a, 6b which makes X-ray 1 transmitted through a sample to be estimated 2 to come incident on it, a second spectro crystal pair 9a, 9b which makes the X-ray to come incident on it, and two crystals spectroscopes 12a, 12b which are arranged between the X-ray source 11 and the first spectro crystal pair 6a, 6b. The first spectro crystal pair 6a, 6b and the second spectro crystal pair 9a, 9b have an asymmetric reflection effect. The spectro crystal pairs 6a, 6b, 9a, 9b are arranged so that a magnification direction by the first spectro crystal pair 6a, 6b crosses at right angles with a magnification direction by the second spectro crystal pair 9a, 9b. At the same time, the X-ray from the X-ray source 11 is made to be monochromatic by the two crystals spectroscopes 12a, 12b.