High voltage metal-oxide-semiconductor transistor device and method of forming the same,申请号US201414506700-传众专利搜索

High voltage metal-oxide-semiconductor transistor device and method of forming the same

申请公布号：US9443958(B2)

申请号：US201414506700

申请日期：2014.10.06

申请公布日期：2016.09.13

申请人：

UNITED MICROELECTRONICS CORP.

发明人：Hsu Ming-Shun

分类号：H01L29/78;H01L29/66;H01L29/423

主分类号：H01L29/78

代理人：Hsu Winston;Margo Scott

地址：Hsin-Chu TW

摘要：A HVMOS transistor device is provided. The HVMOS has a substrate, a gate structure, a drain region and a source region, a base region and a gate dielectric layer. The substrate has a first insulating structure disposed therein. The gate structure is disposed on the substrate and comprises a first portion covering a portion of the first insulating structure. The drain region and the source region are disposed in the substrate at two respective sides of the gate, and comprise a first conductivity type. The base region encompasses the source region, wherein the base region comprises a second conductivity type complementary to the first conductivity type. The gate dielectric layer is between the gate and the drain region, the base region and the substrate. The gate structure further comprises a second portion penetrating into the base region. A method of forming the HVMOS is further provided.

主权项：1. A high voltage metal-oxide-semiconductor (HVMOS) transistor device comprising: a substrate comprising a first insulating structure disposed therein; a gate structure disposed on the substrate, the gate structure comprising a first portion covering a portion of the first insulating structure; a drain region and a source region disposed in the substrate at two respective sides of the gate structure, the drain region and the source region comprising a first conductivity type; a base region encompassing the source region, the base region comprising a second conductivity type complementary to the first conductivity type; and a gate dielectric layer between the gate structure and the source region, the base region and the substrate, wherein the gate structure further comprises a second portion penetrating into the base region, and a channel is defined between the source region and the drain region along a first direction, and the second portion of the gate structure has a battlement structure along a second direction substantially perpendicular to the first direction.