MINIMALLY INVASIVE INTERSPINOUS PROCESS SPACER IMPLANTS AND METHODS,申请号US20100940130-传众专利搜索

MINIMALLY INVASIVE INTERSPINOUS PROCESS SPACER IMPLANTS AND METHODS

申请公布号：US2011172710(A1)

申请号：US20100940130

申请日期：2010.11.05

申请公布日期：2011.07.14

申请人：

SYNTHES USA, LLC

发明人：THOMMEN DANIEL;WEBER MARKUS;TEISEN JACQUES;KRAFT MARKUS;KAUFMANN FLORIAN;HUNZIKER MARKUS;ASCHMANN FELIX;SALADIN STEFAN;OSWALD MARTIN;RANDEGGER ROMAN

分类号：A61B17/70

主分类号：A61B17/70

摘要：An interspinous process spacer for implantation in an interspinous space between a superior spinous process and an inferior spinous process includes a balloon-like body, a first deployable protrusion and a second deployable protrusion. The body has a distal end, a proximal end and a longitudinal axis extending between the proximal and distal ends. The spacer is arrangeable in an unexpanded configuration and an expanded configuration. The first deployable protrusion is mounted proximate the proximal end and the second deployable protrusion is mounted proximate the distal end. The first and second deployable protrusions are oriented generally parallel to the longitudinal axis in the unexpanded configuration and generally perpendicular to the longitudinal axis in the expanded configuration.