CLEANING METHOD AND CLEANING APPARATUS,申请号KR20040099842-传众专利搜索

CLEANING METHOD AND CLEANING APPARATUS

申请公布号：KR100726049(B1)

申请号：KR20040099842

申请日期：2004.12.01

申请公布日期：2007.06.08

分类号：B08B3/08;H05B33/10;B08B3/00;B08B3/12;C23C14/04;C23C14/24;H01L21/302;H01L21/44;H01L21/461;H01L51/50;H05B33/14

主分类号：B08B3/08

摘要：<p>A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.</p>