Particle sticking prevention apparatus and plasma processing apparatus,申请号US20040959197-传众专利搜索

Particle sticking prevention apparatus and plasma processing apparatus

申请公布号：US2005087136(A1)

申请号：US20040959197

申请日期：2004.10.07

申请公布日期：2005.04.28

申请人：

TOKYO ELECTRON LIMITED

发明人：MORIYA TSUYOSHI;NAGAIKE HIROSHI;HAYASHI TERUYUKI;FUJIHARA KAORU

分类号：B65G49/06;C23C16/00;H01L21/00;H01L21/30;H01L21/68;(IPC1-7):C23C16/00

主分类号：B65G49/06

摘要：In order to prevent particles within a unit from sticking to a substrate in a substrate processing process, an ion generator charges the particles. At the same time, a direct current voltage of the same polarity as the charged polarity of the particles is applied from a direct current power source to the substrate. In order to prevent generation of particles when producing gas plasma, a high-frequency voltage is applied to the upper and lower electrodes at multiple stages to produce plasma. In other words, at a first step, a minimum high-frequency voltage at which plasma can be ignited is applied to the upper and lower electrodes, thereby producing a minimum plasma. Thereafter, the applied voltage is increased in stages to produce predetermined plasma.