HOT-MELT TYPE INK COMPOSITION

申请公布号：JPH04359073(A)

申请号：JP19910132891

申请日期：1991.06.04

申请公布日期：1992.12.11

申请人：

SEIKO EPSON CORP

发明人：KANBAYASHI KENICHI;MATSUZAKI MAKOTO;KANAI FUMIYUKI

分类号：C09D11/00;C09D11/02;C09D11/03;C09D11/06;C09D11/12;C09D11/328;C09D11/34

主分类号：C09D11/00

摘要：<p>PURPOSE:To obtain the title composition preventing clogging of delivery nozzle and to prolong life of composition itself by making total content of inorganic ions and metallic ions in a hot-melt type ink composition containing a sulfonamide compound and dye into a fixed amount. CONSTITUTION:Total content of inorganic ions and metallic ions in a hot-melt type ink composition containing a sulfonamide compound and dye delivered from an ink-jet recording device under normal temperature, to high-temperature state is <=1,000ppm to give the objective composition. The content of chlorine ion among the inorganic ions is preferably <=500ppm.</p>

SEMICONDUCTOR MANUFACTURE DEVICE

PROCESSING METHOD FOR SILVER HALIDE PHOTOGRAPHIC SENSITIVE MATERIAL AND AUTOMATIC DEVELOPING MACHINE USED IN THE METHOD

CYLINDRICAL SUPERCONDUCTING MAGNETIC SHIELD

REMOTE PRESERVATION EXECUTION SYSTEM

TERMINAL SG INFORMATION MANAGING SYSTEM

SEMICONDUCTOR WAFER

SEMICONDUCTOR INTEGRATED CIRCUIT HANDLING APPARATUS

DIE BONDING DEVICE

MANUFACTURE OF INTEGRATED CIRCUIT DEVICE

SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND ITS MANUFACTURE

PLASMA CVD APPARATUS

MANUFACTURE OF LIQUID-CRYSTAL DISPLAY DEVICE

STABILIZATION OF SEMICONDUCTOR SURFACE AND MANUFACTURE OF SEMICONDUCTOR DEVICE

METHOD AND APPARATUS FOR PLASMA TREATMENT

SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF

MANUFACTURE OF SEMICONDUCTOR DEVICE

SEMICONDUCTOR-WAFER CLEANING APPARATUS

MICROWAVE PLASMA PROCESSOR

SEMICONDUCTOR MANUFACTURING DEVICE