DEFECT ANALYTICAL DEVICE,申请号JP20000365047-传众专利搜索

DEFECT ANALYTICAL DEVICE

申请公布号：JP2002168798(A)

申请号：JP20000365047

申请日期：2000.11.30

申请公布日期：2002.06.14

申请人：

TOSHIBA CORP;JEOL LTD;NIPPON DENSHI RAIOSONIKKU KK

发明人：TAGUCHI MINORU;TAKASU SHINICHI

分类号：G01B11/00;G01N21/956;G01R31/302;G02B21/00;H01L21/66;(IPC1-7):G01N21/956

主分类号：G01B11/00

摘要：PROBLEM TO BE SOLVED: To provide a defect analytical device capable of executing easily position confirmation of a defect spot or the like by acquiring a clear optical image and acquiring a precise OBIC image. SOLUTION: This device is equipped with a light generation part 6 for radiating a laser beam, a scanning part 9 for scanning the laser beam radiated by the light generation part 6, and simultaneously irradiating a semiconductor device 2 with the beam, an OBIC detection part 17 for detecting OBIC generated on the semiconductor device 2 by irradiation of the laser beam, a light detection part 13 for detecting reflected light of the laser beam with which the semiconductor device 2 is irradiated, and an image formation part 19 for forming the OBIC image and the optical image in a light beam irradiation region of the semiconductor device 2 based on a scanning signal of the scanning part 9 and each detection signal from the OBIC detection part 17 and the light detection part 13. In the device, the light generation part 6 is provided with a first light beam source 4 and a second light beam source 5 having different light generation wavelengths for forming the OBIC image and the optical image respectively.